|
|
|
|
The PHI 5000 VersaProbe is a multi-technique surface
analysis instrument based on PHI’s highly successful scanning x-ray microprobe
technology. This technology provides high performance XPS micro-area
spectroscopy, chemical imaging, and secondary electron imaging with a raster
scanned 10 µm diameter x-ray beam. PHI’s innovative and patented dual beam
charge neutralization method provides turn-key analysis of insulating samples
using a combination of low energy ions and electrons. The integral floating
column argon ion gun provides an impressive sputter depth profiling capability
for inorganic thin film structures. The optional C60 ion gun provides
a unique and powerful organic sputter depth profiling capability.
Important features of the PHI 5000 VersaProbe
include:
- Patented scanning x-ray
microprobe design with <10um diameter minimum x-ray beam size
- Secondary electron and
chemical imaging
- High sensitivity micro
area spectroscopy
- High performance thin
film analysis
- Versatile multi-technique
platform
- Optional C60 sputter ion
source
|
|
|
|
PHI 5000 VersaProbe Brochure
|
 |
|
