Thickness and optical constants (n and k) are measured quickly and easily with the F20 advanced spectrometry system. Spectral analysis of reflectance from the top and bottom of the thin film provides thickness, refractive index, and extinction coefficient in less than a second. The entire desktop system sets up in minutes and can be used by anyone with basic computer skills.

The F20 includes everything required for measurements: spectrometer, light source, fiber optic cable, sample stage, computer and Windows™ application software.

The F20-HC is based on the Filmetrics F20 platform where analysis of spectral reflectance data provides film measurement results quickly. Plus, the advanced simulation algorithms in the F20-HC software are specifically designed to measure single and multiple layers (e.g., primer/hardcoat) encountered in thick film and opthalmic lens applications.

For applications where the surface is curved, the CP-NIR Contact Probe is included.

The F20-XT is optimized to measure thick films. Measuring films greater than 50 microns presents a unique challenge because of the high optical thickness often encountered (optical thickness = physical thickness x index). Some films, such as silicon, also become opaque in the visible wavelengths when thicker than a few microns.

To overcome these challenges, the F20-XT, based on the F20-NIR platform, contains a 512-element InGaAs spectrometer. Covering a wavelength range of 1200-1450 nm, this system maintains a 0.5 nm wavelength resolution in the NIR region, enabling it to detect thicker films more effectively than other optical-based system.

The Most Powerful Tool Available for Monitoring Thin-Film Deposition. Measure deposition rates, layer thickness, optical constants (n and k), and uniformity of semiconductors and dielectric layers in real-time with the F30 spectral reflectometry system.

Turns Your Microscope into a Thin-Film Thickness Measuring Tool. Spectral analysis of reflections from the top and bottom of the thin film provides thickness in seconds. For measurements on patterned surfaces and other applications that require a spot size as small as 10 microns, just add the model F40 to your microscope. For common microscopes the F40 is a simple bolt-on attachment, complete with a c-mount for a CCD camera.

The F42 thickness mapping system maps automated large area samples. Measurement rates are as fast as 1000x1000 points per 30 second.

Thin-film thickness and n&k are mapped quickly and easily with the F50 advanced spectral reflectance system. The motorized R-θ stage moves automatically to selected measurement points and provides thickness measurements in seconds. Choose one of the dozens of predefined polar, rectangular, or linear map patterns, or create your own with no limit on the number of measurement points. The entire desktop system is set up in minutes and can be used by anyone with basic computer skills.