The nanoPVD is a compact benchtop high-performance, high-vacuum deposition system. It provides superior space-efficient performance for a variety of thin-film deposition techniques. The tools are easy to use, represent outstanding value for money and are ideal where available space and budget are key considerations – without compromising on quality of results.
Key Features and Benefits
♦ Automated turbomolecular pumping system
♦ Cleanroom compatible
♦ Excellent price-performance ratio
Techniques
♦ Magnetron sputtering with RF and/or DC power
♦ Magnetron sputtering, wide-area configuration
♦ nanoPVD system with low-temperature evaporation (LTE)
About Moorfield
Since 1989, Moorfield has specialized itself in vacuum deposition equipment (PVD/CVD) for pilot-scale industrial production and high-end educational institutions. Their system designs involve extensive modularity which results in flexible solutions. The product range, which consists of different functionalities, is sized for deposition of metals, inorganics and organics.
Why Moorfield?
♦ Excellence in vacuum technology since 1989
♦ Laboratory equipment to match your research needs
♦ Multiple platforms and infinite options