Plasma etching technology from Moorfield is used for Soft Etching of sensitive materials, reactive ion etching (RIE) and for substrate cleaning. The technology is available packaged into dedicated nanoETCH tools or in combination with other hardware inside larger MiniLab process chambers and load-locks.
Soft Etching technology
Unlike conventional etching systems, nanoETCH systems from Moorfield are optimised for 2D materials R&D through the precise delivery of low-plasma-etching powers, technology referred to as soft-etching. Such fine control is essential for researchers working with layered materials with characteristic dimensions on the single-atom scale.
The nanoETCH instruments are fully automatic and touchscreen operated, are equipped with precisely controlled RF power generation and process gas introduction in a ultra-compact benchtop design.
Soft Etching technology is optimised for providing the fine control required for substrate and device preparation in graphene and 2D materials research:
Please click on ‘Request Application Note’ and download the full application note ‘Soft plasma etching for Graphene and 2D Materials’.