Latent Images of Exposed EUV Photoresist

Latent Images of Exposed EUV Photoresist

Nanoscale chemical microscopy for studying the light-induced chemistry in photoresist

Nanoscale chemical microscopy for studying the light-induced chemistry in photoresist. Understanding light-induced chemical changes in photo-resist can help in the optimization and quality of photo-lithography processes. Photo-induced Force Microscopy is able to analyze subtle chemical changes with high spatial resolution (< 10nm) and surface sensitivity.