Atomic force microscopy

Playing a critical role in the development of atomic force microscopy technology, Park Systems has remained the leading innovator in nanoscale microscopy and metrology throughout its long history and continues to invest in the development of new emerging technologies. With headquarters in Korea, the US, Japan, Singapore and Europe, they create some of the world’s most accurate and most effective AFMs for research and industry.

Materials Science

Small sample systems

♦   XE7 / Economical choice for innovative research

♦   NX10 / Including Smartscan™ Automode and Pinpoint methods


Park NX20Large sample systems

♦   XE15 / Best value large sample AFM

♦   NX20 / Leading nano metrology tool for failure analysis and large sample research

♦   NX20 300mm / Leading automated nano metrology tool for 300 mm wafer measurement and analysis

Life sciences and Chemical

Bio Science

♦   NX12 / Versatile and flexible platform for multi-user facilities

♦   NX-Bio / SICM, AFM and optical inverted microscopy

♦   NX10 SICM / AFM and SICM nanoscale imaging in aqueous environments

Industrial applications

3D Metrology

♦    NX-3DM / Completely automated AFM for overhang profiles, high-resolution sidewall imaging and critical angle measurements

Automatic Defect Review

♦    NX-HDM / Automatic defect review and surface roughness imaging

♦    NX-Wafer / Wafer Fab AFM with automatic defect review

Hard Disk

♦    NX-PTR / Automatic AFM for accurate inline metrology of hard disk head sliders

NX--Hivac---High Vacuum AFM

♦    NX-Hivac / High Vacuum AFM for failure analysis