Playing a critical role in the development of atomic force microscopy technology, Park Systems has remained the leading innovator in nanoscale microscopy and metrology throughout its long history and continues to invest in the development of new emerging technologies. With headquarters in Korea, the US, Japan, Singapore and Europe, they create some of the world’s most accurate and most effective AFMs for research and industry.
♦ NX-3DM / Completely automated AFM for overhang profiles, high-resolution sidewall imaging and critical angle measurements
♦ NX-Wafer / Wafer Fab AFM with automatic defect review
♦ NX-PTR / Automatic AFM for accurate inline metrology of hard disk head sliders
♦ NX-HDM / Automatic defect review and surface roughness imaging