Atomic force microscopy

Playing a critical role in the development of atomic force microscopy technology, Park Systems has remained the leading innovator in nanoscale microscopy and metrology throughout its long history and continues to invest in the development of new emerging technologies. With headquarters in Korea, the US, Japan, Singapore and Europe, they create some of the world’s most accurate and most effective AFMs for research and industry.


Small Sample AFM

♦   NX-Hivac / High Vacuum AFM for failure analysis

♦   NX12 / Versatile and flexible platform for multi-user facility

♦   NX10 / Including Smartscan™ Automode and Pinpoint methods

♦   XE7 / Economical choice for innovative research



Industrial applications

Automated AFM

♦    NX-3DM / Completely automated AFM for overhang profiles, high-resolution sidewall imaging and critical angle measurements

♦    NX-Wafer / Wafer Fab AFM with automatic defect review

♦    NX-PTR / Automatic AFM for accurate inline metrology of hard disk head sliders

♦    NX-HDM / Automatic defect review and surface roughness imaging


Large Sample AFM

♦   NX20 300mm / Leading automated nano metrology tool for 300 mm wafer measurement and analysis

♦   NX20 / Leading nano metrology tool for failure analysis and large sample research

♦   XE15 / Best value large sample AFM

Bio and Chemical


♦   NX-12Bio / SICM, AFM and optical inverted microscopy

♦   NX10 SICM / AFM and SICM nanoscale imaging in aqueous environments