09 Jan Webinar: Ion gun Options and Capabilities on Physical Electronics XPS Systems
Groot-Ammers | January 9th, 2020
On Thursday, January 16th, at 10:00 AM (Chicago), Dr. Benjamin Schmidt, Staff Scientist at Physical Electronics will organize a webinar ‘Ion gun Options and Capabilities on Physical Electronics XPS Systems’.
XPS analysis typically provides elemental and chemical state information from the top few nanometers of a material surface. However, many materials of interest have buried layers and interfaces that are deeper than this surface region. Non-destructive methods of probing deeper into a sample, such as using alternative X-ray sources with different photon energies and subsequent photoelectron escape depths, or changing the sample-analyzer angle for angle-dependent analysis, have depth limitations. An alternative method is to use an ion beam to sputter away surface layers and expose fresh surfaces in deeper layers for analysis.
Typically, the goal of ion beam sputtering is to remove surface layers and reach features of interest while maintaining useful elemental and chemical state information under reasonable sputter and data acquisition times. Monoatomic argon ion beams have long been used for surface cleaning and sputter depth profiling. However, many materials exhibit ion-induced damage and loss of chemical state information with these ion species. Cluster ion beams composed of C 60 or argon were developed to address these limitations for ion-beam sensitive materials. Novel materials often contain multiple organic and inorganic components, which presents challenges when choosing the appropriate ion beam species and sputter conditions.