UVISEL Plus In-Situ

The UVISEL Plus in-situ spectroscopic ellipsometer can be easily mounted on process chambers (PECVD, MOCVD, sputter, evaporation, ALD, MBE) for the real-time control of thin film deposition or etch processes.

The UVISEL Plus in-situ provides the unique combinations of very high speed, sensitivity, dynamic range and accuracy making the instrument able to control deposition / etch at the atomic layer thickness level, even for rapid processes.

Using our new adaptation kit it is possible to use the same ellipsometer for in-situ and benchtop application on a goniometer. Switching between the two configurations and aligning the system is extremely straightforward.

The UVISEL Plus in-situ ellipsometer is driven by the DeltaPsi2 software platform that is common to all HORIBA Jobin Yvon thin film metrology tools. The software provides real-time data acquisition and modelling / reprocessing capabilities. Advanced communication protocols including TCP/IP and RS232 have been designed for production environments and OEM needs.

ICON-key-features-greyKey Features and Benefits

♦   Highest speed and accuracy

♦   Fully integrated software package for real-time measurement, modelling and reporting

♦   Easy switch between in-situ and ex-situ configurations


♦   Thin film thickness

♦   Optical constants (n,k)

♦   Material composition

About HORIBA Scientific

HORIBA Scientific offers 200 years of experience in developing high-performance scientific instruments and analytical solutions. It’s a world-leading supplier providing researchers superior products and solutions, supported by a global network of service and application support.

Why Horiba Scientific?

♦   Worldwide leader in analytical solutions

♦   200 years of experience in R&D

♦   Research driven, leading-edge technology

♦   Complementary product range

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