The UVISEL Plus in-situ spectroscopic ellipsometer can be easily mounted on process chambers (PECVD, MOCVD, sputter, evaporation, ALD, MBE) for the real-time control of thin film deposition or etch processes.
The UVISEL Plus in-situ provides the unique combinations of very high speed, sensitivity, dynamic range and accuracy making the instrument able to control deposition / etch at the atomic layer thickness level, even for rapid processes.
Using our new adaptation kit it is possible to use the same ellipsometer for in-situ and benchtop application on a goniometer. Switching between the two configurations and aligning the system is extremely straightforward.
The UVISEL Plus in-situ ellipsometer is driven by the DeltaPsi2 software platform that is common to all HORIBA Jobin Yvon thin film metrology tools. The software provides real-time data acquisition and modelling / reprocessing capabilities. Advanced communication protocols including TCP/IP and RS232 have been designed for production environments and OEM needs.
♦ Highest speed and accuracy
♦ Fully integrated software package for real-time measurement, modelling and reporting
♦ Easy switch between in-situ and ex-situ configurations
♦ Thin film thickness
♦ Optical constants (n,k)
♦ Material composition
HORIBA Scientific offers 200 years of experience in developing high-performance scientific instruments and analytical solutions. It’s a world-leading supplier providing researchers superior products and solutions, supported by a global network of service and application support.
♦ Worldwide leader in analytical solutions
♦ 200 years of experience in R&D
♦ Research driven, leading-edge technology♦
♦ Complementary product range♦