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Vacuum Deposition

These techniques are used to deposit thin layers of material on a solid surface. All processes are operated at pressures well below the atmospheric pressure. Vacuum deposition includes small scale R&D to pilot scale production systems for thin film deposition of Physical Vapor Deposition (PVD) and Chemical Vapor Deposition (CVD). There are multiple techniques like e-beam, magnetron sputtering, and low- & high temperature thermal evaporation.

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Physical Vapor Deposition

EVAPORATION & MAGNETRON SPUTTERING

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♦   MiniLab 026 | Compact floor standing vacuum evaporator

♦   MiniLab 030| High Quality PVD System

♦   MiniLab 070 | Multiple source magnetron sputtering system

♦   MiniLab 080 | High aspect ratio PVD system

♦   MiniLab 090 | Glovebox-compatible PVD system

♦   MiniLab 125 | High volume PVD system

♦   nanoPVD-S10A | Compact benchtop high-performance, for RF and DC magnetron sputtering

♦   nanoPVD-T15A | Compact benchtop high-performance, for thermal- and low temperature evaporation

♦   nanoPVD-ST15A | Compact benchtop high-performance, for thermal evaporation and magnetron sputtering[/vc_column_text][/vc_column][vc_column width=”1/3″][vc_column_text css=”.vc_custom_1696928649583{padding-top: 10px !important;padding-right: 10px !important;padding-bottom: 10px !important;padding-left: 10px !important;}”]

Chemical Vapor Deposition

GRAPHENE & CARBON NANOTUBES

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♦   nanoCVD-8G | For graphene

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Etching

SUBSTRATE & DEVICE PREPARATION

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♦    nanoETCH | Modular Plasma Etching System[/vc_column_text][/vc_column][vc_column width=”1/3″][vc_column_text css=”.vc_custom_1698743301135{padding-top: 10px !important;padding-right: 10px !important;padding-bottom: 10px !important;padding-left: 10px !important;}”]

Thermal Processing/ Annealing

SUBSTRATE & DEVICE PREPARATION

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♦    ANNEAL | Thermal treatment of thin films[/vc_column_text][/vc_column][/vc_row]