These techniques are used to deposit thin layers of material on a solid surface. All processes are operated at pressures well below the atmospheric pressure. Vacuum deposition includes small scale R&D to pilot scale production systems for thin film deposition of Physical Vapour Deposition (PVD) and Chemical Vapour Deposition (CVD). There are multiple techniques like e-beam, magnetron sputtering, and low- & high temperature thermal evaporation.
Physical Vapour Deposition
EVAPORATION & MAGNETRON SPUTTERING
Soft etching and thermal processing
SUBSTRATE & DEVICE PREPARATION
♦ Minilab Platforms / Superior coating performance and flexible configurations
♦ nanoPVD-S10A / Compact benchtop high-performance, for RF and DC magnetron sputtering
♦ nanoPVD-T15A / Compact benchtop high-performance, for thermal- and low temperature evaporation
♦ nanoEM / Coating tool with a full research-grade feature set
♦ M307 / Budget-friendly, entry-level vacuum deposition
Chemical Vapour Deposition
GRAPHENE & CARBON NANOTUBES
♦ nanoCVD-8G / For graphene
♦ nanoCVD-WPG / For graphene, wafer-scale, plasma-enhanced
♦ nanoCVD-8N / For carbon nanotubes