Vacuum deposition

Vacuum Deposition

These techniques are used to deposit thin layers of material on a solid surface. All processes are operated at pressures well below the atmospheric pressure. Vacuum deposition includes small scale R&D to pilot scale production systems for thin film deposition of Physical Vapour Deposition (PVD) and Chemical Vapour Deposition (CVD). There are multiple techniques like e-beam, magnetron sputtering, and low- & high temperature thermal evaporation.

Physical Vapour Deposition

EVAPORATION & MAGNETRON SPUTTERING

Soft etching and thermal processing

SUBSTRATE & DEVICE PREPARATION

♦   Minilab Platforms / Superior coating performance and flexible configurations

♦   nanoPVD-S10A / Compact benchtop high-performance, for RF and DC magnetron sputtering

♦   nanoPVD-T15A / Compact benchtop high-performance, for thermal- and low temperature evaporation

♦   nanoEM / Coating tool with a full research-grade feature set

♦   M307 / Budget-friendly, entry-level vacuum deposition

soft plasma etching

♦    nanoETCH / Dedicated soft-etching instruments

♦    ANNEAL / Thermal treatment of 2D materials

Chemical Vapour Deposition

GRAPHENE & CARBON NANOTUBES

chemical vapor deposition

♦   nanoCVD-8G / For graphene

♦   nanoCVD-WPG / For graphene, wafer-scale, plasma-enhanced

♦   nanoCVD-8N / For carbon nanotubes