Vacuum Deposition - ST Instruments
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Vacuum Deposition

Vacuum Deposition

Vacuum Deposition

These techniques are used to deposit thin layers of material on a solid surface. All processes are operated at pressures well below the atmospheric pressure. Vacuum deposition includes small scale R&D to pilot scale production systems for thin film deposition of Physical Vapour Deposition (PVD) , Chemical Vapour Deposition (CVD) and Atomic Layer Deposition (ALD). There are multiple techniques like e-beam, magnetron sputtering, and low- & high temperature thermal evaporation.

Physical Vapour Deposition

EVAPORATION & MAGNETRON SPUTTERING

♦   MiniLab 026 | Compact floor standing vacuum evaporator

♦   MiniLab 060 | Multiple source magnetron sputtering system

♦   MiniLab 080 | High aspect ratio PVD system

♦   MiniLab 090 | Glovebox-compatible PVD system

♦   MiniLab 125 | High volume PVD system

♦   nanoPVD-S10A | Compact benchtop high-performance, for RF and DC magnetron sputtering

♦   nanoPVD-T15A | Compact benchtop high-performance, for thermal- and low temperature evaporation

♦   nanoEM | Coating tool with a full research-grade feature set

Atomic Layer Deposition

LAB- & COMMERCIAL-SCALE ALD SOLUTIONS

Atomic Layer Deposition

♦   Prometheus | Advanced R&D System for Powders

♦   Athena | R&D Scale Object Coating

♦   Apollo | High Throughput Rapid Wafer Coating

Chemical Vapour Deposition

GRAPHENE & CARBON NANOTUBES

chemical vapor deposition

♦   nanoCVD-8G | For graphene

♦   nanoCVD-WPG | For graphene, wafer-scale, plasma-enhanced

♦   nanoCVD-8N | For carbon nanotubes