These techniques are used to deposit thin layers of material on a solid surface. All processes are operated at pressures well below the atmospheric pressure. Vacuum deposition includes small scale R&D to pilot scale production systems for thin film deposition of Physical Vapor Deposition (PVD) and Chemical Vapor Deposition (CVD). There are multiple techniques like e-beam, magnetron sputtering, and low- & high temperature thermal evaporation.
♦ MiniLab 026 | Compact floor standing vacuum evaporator
♦ MiniLab 060 | Multiple source magnetron sputtering system
♦ MiniLab 080 | High aspect ratio PVD system
♦ MiniLab 090 | Glovebox-compatible PVD system
♦ MiniLab 125 | High volume PVD system
♦ nanoPVD-S10A | Compact benchtop high-performance, for RF and DC magnetron sputtering
♦ nanoPVD-T15A | Compact benchtop high-performance, for thermal- and low temperature evaporation
♦ nanoPVD-ST15A | Compact benchtop high-performance, for thermal evaporation and magnetron sputtering
♦ nanoEM | Coating tool with a full research-grade feature set
♦ nanoCVD-8G | For graphene
♦ nanoCVD-WPG | For graphene, wafer-scale, plasma-enhanced
♦ nanoCVD-8N | For carbon nanotubes
♦ ANNEAL | Thermal treatment of 2D materials
