nanoPVD-S10A – Research Grade RF/DC Magnetron Sputtering  System

Model S10A is a magnetron sputtering system designed for repeatable coating of metals or inorganics (e.g., oxides or nitrides). At the heart of the system is a modular process chamber. The chamber is designed for easy disassembly for routine maintenance. At the rear of the vacuum chamber is a port for the pumping system. The pumping system is based on a turbomolecular pump that is connected to a rotary or scroll-type backing pump. The nanoPVD systems are optimized for ease of use, represent outstanding value for money and are ideal where available space and budgets are key considerations — without compromising on quality of results.


ICON-key-features-greyKey Features and Benefits

♦   Up to 3x 2” magnetron sputtering sources and 4” substrates (wide area stages optional)

♦   Up to 3 MFC-controlled process gasses for reactive sputtering

♦   Several options such as substrate rotation, heating, Z-shift, co-deposition, QCM sensor head and fast chamber vent


♦   DC, RF Sputter supply

♦   Sputter switch technology, allowing multiple sources to be run from same power supply

♦   Fundamental research, education  and product R&D                     


About Moorfield

Since 1989, Moorfield has specialized itself in vacuum deposition equipment (PVD/CVD) for pilot-scale industrial production and high-end educational institutions. Their system designs involve extensive modularity which results in flexible solutions. The product range, which consists of different functionalities, is sized for deposition of metals, inorganics and organics.


Why Moorfield?

♦   Excellence in vacuum technology since 1989

♦   Laboratory equipment to match your research

♦   Multiple platforms and infinite options

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