Physical Vapor Deposition
Flexible, modular PVD systems for high quality R&D and pilot-scale production.
♦ MiniLab 026 | Compact, floor standing system
♦ MiniLab 060 | Moorfield’s most popular system
♦ MiniLab 080 | Tall chamber, ideally suited for thermal, LTE & E-beam
♦ MiniLab 090 | Glovebox Compatible
♦ MiniLab 125 | Pilot-scale, modular system
High-performance, high-vacuum benchtop PVD systems
♦ nanoPVD-T15A | R&D Scale Object Coating
♦ nanoPVD-ST15A | Compact benchtop high-performance, for thermal evaporation and magnetron sputtering
♦ nanoPVD-S10A-WA | Wide area configuration
♦ nanoPVD-S10A | Benchtop RF and DC magnetron sputtering
♦ nanoEM | Coating tool with a full research-grade feature set
Physical Vapor Deposition (PVD) is a sophisticated thin-film coating process used across industries for enhancing material properties and creating functional surfaces. PVD involves several fundamental steps:
PVD offers several advantages, including the ability to control coating thickness, even on complex shapes, and to enhance material properties like hardness, corrosion resistance, and optical properties. It is used in a wide range of applications, from creating protective layers on cutting tools to producing decorative finishes on various items. PVD’s versatility makes it a key technology in tailoring material surfaces to meet specific functional and aesthetic requirements.
Physical Vapor Deposition (PVD) is a favored coating technique due to its numerous advantages and versatile applications. Here’s why one would choose to use PVD:
In summary, PVD is chosen for its ability to tailor material properties, coat complex shapes, improve performance, and achieve aesthetic finishes. Its versatility makes it applicable to various industries, contributing to enhanced product functionality and quality.