Model ST15A has been purpose-designed to accommodate both vacuum evaporation and magnetron sputtering sources within the a single process chamber. Available source types are low-temperature evaporation (LTE), standard resistive evaporation, and magnetron sputtering (2″ targets) for deposition of organics, dielectrics, and metals.
♦ Deposition of metals, organics and dielectrics
♦ Flexible source arrangement
♦ Numerous options available such as 500° sample heating, substrate rotation, substrate Z-shift and QCM sensor head
♦ Thermal evaporation
♦ Low temperature evaporation
♦ Magnetron sputtering
Since 1989, Moorfield has specialized itself in vacuum deposition equipment (PVD/CVD) for pilot-scale industrial production and high-end educational institutions. Their system designs involve extensive modularity which results in flexible solutions. The product range, which consists of different functionalities, is sized for deposition of metals, inorganics and organics.
♦ Excellence in vacuum technology since 1989
♦ Laboratory equipment to match your research
♦ needs
♦ Multiple platforms and infinite options
Compact benchtop high-performance, for thermal- and low temperature evaporation
Compact benchtop high-performance, for RF and DC magnetron sputtering