MiniLab 080 is a floor-standing system for metal, dielectric and/or organics thin-film deposition. It contains a box-type stainless-steel chamber with front door for sample loading/ unloading (load-locks also available). The chamber has a high aspect-ratio, ideal for long working distances for high-uniformity coating via evaporative techniques. A turbomolecular pumping system is standard, for high-vacuum base pressures of better than 5 × 10-7 mbar. The chamber sits on a double-rack frame that contains all system control electronics and power supplies. MiniLab 080 systems are available with load-locks.
Key Features and Benefits
♦ High aspect ratio, ideal for E-beam Evaporation
♦ Substrate stages up to 11” diameter with optional rotation, heating, cooling, bias, Z-shift and source/substrate shutters
♦ Complementary techniques like etching, annealing and ion-beam sources
Techniques
♦ Magnetron Sputtering, E-Beam Evaporation, Thermal Evaporation and Low-Temperature Evaporation
♦ Metals, Dielectrics and organics deposition
♦ Automatic, manual, sequential and co-deposition
About Moorfield
Since 1989, Moorfield has specialized itself in vacuum deposition equipment (PVD/CVD) for pilot-scale industrial production and high-end educational institutions. Their system designs involve extensive modularity which results in flexible solutions. The product range, which consists of different functionalities, is sized for deposition of metals, inorganics and organics.
Why Moorfield?
♦ Excellence in vacuum technology since 1989
♦ Laboratory equipment to match your research
♦ needs
♦ Multiple platforms and infinite options
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