MiniLab 125 systems are floor-standing vacuum evaporators for metal, dielectric and/or organics thin-film deposition. All systems contain a box-type high volume (125 L) stainless-steel chamber with front door for loading/unloading. A turbomolecular pumping system is standard, for high-vacuum base pressures of better than 5 × 10-7 mbar. The large chamber allow for more techniques and flexibility than their smaller counterparts. In addition to thin-film deposition, MiniLab systems can also be fitted with complementary techniques such as ion beam sources, etching components and annealing stages.
Key Features and Benefits
♦ Large volume process chamber for multiple techniques
♦ Substrate stages up to 11” diameter with optional rotation, heating, cooling, bias, Z-shift and source/substrate shutters
♦ Inserting substrates through load-lock for fast pump-down
Techniques
♦ Magnetron Sputtering, E-Beam Evaporation, Thermal Evaporation and Low-Temperature Evaporation
♦ Metals, Dielectrics and organics deposition
♦ Automatic, manual, sequential and co-deposition
About Moorfield
Since 1989, Moorfield has specialized itself in vacuum deposition equipment (PVD/CVD) for pilot-scale industrial production and high-end educational institutions. Their system designs involve extensive modularity which results in flexible solutions. The product range, which consists of different functionalities, is sized for deposition of metals, inorganics and organics.
Why Moorfield?
♦ Excellence in vacuum technology since 1989
♦ Laboratory equipment to match your research
♦ needs
♦ Multiple platforms and infinite options
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