♦ Process chamber can be equipped with load-load
♦ Substrate stages up to 11” diameter with optional rotation, heating, cooling, bias, Z-shift and source/substrate shutters
♦ Complementary techniques like etching, annealing and ion-beam sources
♦ Magnetron Sputtering, E-Beam Evaporation, Thermal Evaporation and Low-Temperature Evaporation
♦ Metals, Dielectrics and organics deposition
♦ Automatic, manual, sequential and co-deposition
Since 1989, Moorfield has specialized itself in vacuum deposition equipment (PVD/CVD) for pilot-scale industrial production and high-end educational institutions. Their system designs involve extensive modularity which results in flexible solutions. The product range, which consists of different functionalities, is sized for deposition of metals, inorganics and organics.
♦ Excellence in vacuum technology since 1989
♦ Laboratory equipment to match your research
♦ needs
♦ Multiple platforms and infinite options