nanoCVD-WGP

The nanoCVD-WGP is optimized for graphene synthesis. This system is designed for wafer scale applications together with the addition of plasma-enhanced capability in a cold-walled chamber. The system provides for heating to high temperatures under controlled atmospheres containing flows of argon, hydrogen and nitrogen. Many different feedstocks can be used such as methane, ethylene, solids (PMMA), and more.


ICON-key-features-greyKey Features and Benefits

♦   Cleanroom compatible

♦   Wafer-scale synthesis: 3” or 4”

♦   Implements proven nanoCVD technology

ICON-key-features-greyApplications

♦   Graphene & 2D materials

♦   Biological, chemical and mechanical sensors

♦   Electrical energy storage

About Moorfield

Since 1989, Moorfield has specialized itself in vacuum deposition equipment (PVD/CVD) for pilot-scale industrial production and high-end educational institutions. Their system designs involve extensive modularity which results in flexible solutions. The product range, which consists of different functionalities, is sized for deposition of metals, inorganics and organics.

Moorfield

Why Moorfield?

♦   Excellence in vacuum technology since 1989

♦   Laboratory equipment to match your research

♦   needs

♦   Multiple platforms and infinite options

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