The nanoCVD-8G is a compact, turn-key and scalable chemical vapour deposition (CVD) system for rapid synthesis of high quality graphene. The system is optimized to allow for a wide range of synthetic schemes. These include those based on metal substrates and CH4 feedstock that are widely employed for producing high-quality graphene.
Key Features and Benefits
♦ Low thermal-mass heater stage for uniform heating of film and foil
substrates
♦ Fully automatic
♦ 1100 °C maximum temperature
Applications
♦ Electrodes for photovoltaics
♦ High-performance electronics
♦ Electrical energy storage
About Moorfield
Since 1989, Moorfield has specialized itself in vacuum deposition equipment (PVD/CVD) for pilot-scale industrial production and high-end educational institutions. Their system designs involve extensive modularity which results in flexible solutions. The product range, which consists of different functionalities, is sized for deposition of metals, inorganics and organics.
Why Moorfield?
♦ Excellence in vacuum technology since 1989
♦ Laboratory equipment to match your research
♦ needs
♦ Multiple platforms and infinite options
Related products
For graphene, wafer-scale, plasma-enhanced