nanoCVD-WPG

The nanoCVD-WPG is optimized for high-throughput carbon nanotube (CNT) growth with various substrate/catalyst combinations. This model is designed for wafer (3” or 4”) applications together with the addition of plasma-enhanced capability in a colled-walled chamber. The system provides for heating to high temperatures (up to 1100 °C) under controlled atmospheres containing flows of argon, hydrogen and methane.

nanoCVD-WPG


ICON-key-features-greyKey Features and Benefits

♦   Compact benchtop design

♦   Wafer-scale synthesis: 3” or 4”

♦   Multiple in-chamber plasma electrodes

ICON-key-features-greyApplications

♦   Graphene & 2D materials

♦   Biological, chemical and mechanical sensors

♦   Electrical energy storage

MoorfieldAbout Moorfield

Since 1989, Moorfield has specialized itself in vacuum deposition equipment (PVD/CVD) for pilot-scale industrial production and high-end educational institutions. Their system designs involve extensive modularity which results in flexible solutions. The product range, which consists of different functionalities, is sized for deposition of metals, inorganics and organics.

Why Moorfield?

♦   Excellence in vacuum technology since 1989

♦   Laboratory equipment to match your research needs

♦   Multiple platforms and infinite options