The nanoETCH is a benchtop reactive ion etching (RIE) and plasma surface modification system designed for low-damage processing of advanced materials. Engineered for precise plasma control, the system combines fluorine-based RIE with ultra-low-power soft-etch capabilities, making it ideal for graphene, 2D materials, h-BN, SiO₂, silicon, and other sensitive substrates. Its benchtop design, recipe-based operation, and high process repeatability provide researchers with flexible plasma processing without relying on larger cleanroom etch tools.
Key Features and Benefits
♦ Precisely control plasma power down to approximately 100 mW for gentle etching and surface modification of sensitive materials, enabling highly repeatable and reproducible research results. Up to 3 MFC-controlled process gases
♦ Perform fluorine-based reactive ion etching using SF₆ and CHF₃ chemistries for controlled etching of silicon, silicon dioxide, h-BN, and other advanced materials.
♦ Develop, save, and reproduce optimized plasma processes through intuitive touchscreen operation and automated recipe control, accelerating process development and research productivity.
Applications
♦ Low-damage plasma etching and surface modification for graphene, h-BN, transition metal dichalcogenides (TMDs), and other two-dimensional materials
♦ Controlled fluorine-based etching of silicon, silicon dioxide, thin films, and nanostructures for microfabrication and device developments
♦ Argon and oxygen plasma treatments for substrate cleaning, surface preparation, adhesion improvement, and process optimization prior to deposition or fabrication
About Moorfield
Since 1989, Moorfield has specialized itself in vacuum deposition equipment (PVD/CVD) for pilot-scale industrial production and high-end educational institutions. Their system designs involve extensive modularity which results in flexible solutions. The product range, which consists of different functionalities, is sized for deposition of metals, inorganics and organics.
Why Moorfield?
♦ Excellence in vacuum technology since 1989
♦ Laboratory equipment to match your research
♦ needs
♦ Multiple platforms and infinite options
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