ANNEAL

ANNEAL systems are optimized for the thermal treatment of 2D materials and wafers under controlled atmospheres. Substrates are supported face-up on stage-top platens that are situated centrally inside a stainless-steel high-vacuum chamber fitted with appropriate heat shielding and a shuttered viewport. Heating is via a heat source located beneath the platen. Maximum temperatures up to 1000 °C are possible—depending on the heating technology used.

ANNEAL


ICON-key-features-greyKey Features and Benefits

♦   Up to 6” substrate diameters

♦   Stage temperatures up to 1000 °C

♦   Choice of heating technologies: Quartz lamp, Carbon-carbon composite or SiC-coated CCC

ICON-key-features-greyApplications

♦   Graphene & 2D materials

♦   Semiconductor film processing

♦   Device annealing

 

MoorfieldAbout Moorfield

Since 1989, Moorfield has specialized itself in vacuum deposition equipment (PVD/CVD) for pilot-scale industrial production and high-end educational institutions. Their system designs involve extensive modularity which results in flexible solutions. The product range, which consists of different functionalities, is sized for deposition of metals, inorganics and organics.

Why Moorfield?

♦   Excellence in vacuum technology since 1989

♦   Laboratory equipment to match your research needs

♦   Multiple platforms and infinite options