Groot-Ammers | January  3rd, 2024

Angle-resolved X-ray photoelectron spectroscopy (AR-XPS) is a well-established technique for non-destructive analysis of compositional depth profiles, interfaces, and layer thicknesses. Traditionally, AR-XPS employs an Al Kα X-ray beam capable of probing up to 5-10 nm in depth below the surface.

DATE & TIME
📆 Tuesday, January 9th, 2024
🕔 17:00 (CET) 

Alongside the recently released PHI Genesis – a fully automated multi-technique scanning X-ray microprobe incorporating Cr Kα hard X-ray photoelectron spectroscopy (HAXPES), new features have been implemented in StrataPHI 2.0 data analysis software to reconstruct quantitative, non-destructive depth profiles up to 30 nm below the surface.

In this webinar, we will discuss the basic principles behind AR-XPS and HAXPES analysis and methods for extracting non-destructive depth composition. We will also introduce three major new features in StrataPHI 2.0: 1) an ability to combine XPS and HAXPES data within a single depth profile to enhance extracted analytical information from various depths, 2) a fractional coverage analysis mode, relevant in situations where ultra-thin films exist as discrete islands, and 3) a simulation mode to allow the analyst to predict the best core-level transitions accessible by either XPS or HAXPES for data acquisition based on the ordering and thickness of individual layers in the thin-film stack. Several examples will be discussed to demonstrate such new StrataPHI capabilities.