To provide detailed chemical characterization reaching from atomic layers down to microns. These measurements provide a means to correlate performance with surfaces or thin film composition.
♦ VersaProbe III XPS Scanning Microprobe / Multi-technique XPS including PHI’s patented X-ray beam induced secondary electron imaging.
♦ Quantera II XPS Scanning Microprobe / High throughput automated XPS with the highest small area sensitivity
♦ X-Tool Automated XPS Scanning Microprobe / Push button automated XPS
♦ nanoTOF II TOF-SIMS / patented TRIFT mass spectrometer with superior sensitivity
♦ 710 Scanning Auger Nanoprobe / High spatial resolution Auger imaging performance for the most demanding AES applications
♦ NanoIR2 / Nanospectroscopy by high resolution infrared spectroscopy and imaging with AFM-IR
♦ NanoIR2-s / Nanospectroscopy by high resolution infrared spectroscopy and imaging with AFM-IR and scattering SNOM. The only platform with both techniques.
♦ NanoIR2-FS / Next generation nanoscale IR spectroscopy with FASTspectra™ technology
♦ RAMANforce / Renewed ultra-fast Raman imaging system with even higher spatial resolution near the diffraction limit
♦ RAMANdrive / Specialized Raman microscope for wafer analysis equipped with 300 mm stage
♦ RAMANview / New Raman imaging with a larger field of view, deeper depth of focus and a longer working distance