The NX-HDM is the most innovative AFM for automated defect review and surface roughness measurement. Identifying nanoscale defects is a very time consuming process for engineers working with media and flat substrates. The NX-HDM is an atomic force microscopy system that speeds up the defect review process by an order of magnitude through automated defect identification, scanning and analysis. Park NX-HDM links directly with a wide range of optical inspection tools, thus significantly increasing the automatic defect review throughput.
♦ Automatic defect identification, scanning, and analysis
♦ Sub-Angstrom, surface roughness measurement
♦ Higher throughput with advanced automation technology
♦ Automatic Defect Review of 300mm Bare Wafers
♦ Surface Roughness Measurement of Media and Substrate
♦ Critical Roughness Metrology
Playing a critical role in the development of AFM technology, Park Systems has remained the leading innovator in nanoscale microscopy and metrology throughout its long history and continues to invest in the development of new emerging technologies. With headquarters in Korea, the US, Japan, Singapore and Europe, they create some of the world’s most accurate and most effective AFMs for research and industry.
♦ World-recognized leader in the AFM industry
♦ Unmatched ease of use
♦ The most innovative AFM technology