NX20 300mm
The NX20 300mm is the leading automated nanometrology tool for 300 mm wafer measurement and analysis. Designed for failure analysis and quality control laboratories, the new upgraded Park NX20 system can inspect an entire 300 mm wafer efficiently, while keeping the system noise level below 0.5 angstrom (Å) RMS.
Key Features and Benefits
♦ Flexible 300 mm Sample Chuck
♦ SmartScan™ for simple, yet highly accurate, measurements
♦ Scan multiple sites on the entire 300 mm wafer
Applications
♦ Large sample wafer inspection
♦ Electrical property characterization
♦ MEMS
About Park Systems
Playing a critical role in the development of AFM technology, Park Systems has remained the leading innovator in nanoscale microscopy and metrology throughout its long history and continues to invest in the development of new emerging technologies. With headquarters in Korea, the US, Japan, Singapore and Europe, they create some of the world’s most accurate and most effective AFMs for research and industry.
Why Park Systems?
♦ World-recognized leader in the AFM industry
♦ Unmatched ease of use
♦ The most innovative AFM technology
Related products
Specialized Raman microscope for wafer analysis equipped with 300 mm stage
Wafer Fab AFM with automatic defect review
Quantera II XPS Scanning Microprobe
High throughput automated XPS with the highest small area sensitivity