APOLLO – High throughput wafer coating

The Forge Nano Apollo ALD system is the benchmark tool in productivity and cost effectiveness. Due to the incorporation of the patented Synchronous Modulation of Flow and Draw (SMFD)-ALD feature, the Apollo system is the only system in the world that can run ALD cycles of less then 1 second, without compromising on the quality of the layer. In combination with the integrated cassette and robotic arm, the Apollo is the number one ALD tool for the production of wafer scaled ALD coatings.

ICON-key-features-greyKey Features and Benefits

♦   Field- upgradeable and scalable

♦   Better then 1% non-uniformity across wafer

♦   Ultra fast deposition (12-30 nm/min)                                                                                                                                                                                                                             


♦   Semiconductor (e.g. high k-dielectrics, metal-insulator-metal (MIM) film stacks, ultra-conformal SiO2 for trench isolation, ALD-Cap for chip passivation)

♦   Device fabrication

♦   Flat panel displays, glass and optics

About Forge Nano

Global leaders in surface engineering and precision nano-coating technology, using Atomic Layer Deposition. Forge Nano’s proprietary technology and manufacturing processes make angstrom-thick coatings fast, affordable and commercially viable for a wide range of materials, applications and industries.

Why Forge Nano?

♦  Tools purpose built for performance, efficiency and throughput

♦  From lab scale to commercial scale

♦  In-house R&D department for system optimization

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