HELIOS – High throughput object coatings

The Forge Nano Helios line is designed to produce high quality, pinhole-free layers on large area parts and substrates. The patented Synchronous Modulation of Flow and Draw (SMFD-ALD) process provides the Helios system its breakthrough capabilities including its high throughput ALD at low temperature deposition and fast, high quality and low-stress thick films deposition up to 12 microns.

ICON-key-features-greyKey Features and Benefits

♦   Large deposition chamber (1m x 1m)

♦   High throughput growth (60-150 Å/min)

♦   100% conformal films over any substrate topology


♦   Display and solar technology

♦   Optical coatings and OLED displays

♦   Electronic and medical devices and sensors

About Forge Nano

Global leaders in surface engineering and precision nano-coating technology, using Atomic Layer Deposition. Forge Nano’s proprietary technology and manufacturing processes make angstrom-thick coatings fast, affordable and commercially viable for a wide range of materials, applications and industries.

Why Forge Nano?

♦  Tools purpose built for performance, efficiency and throughput

♦  From lab scale to commercial scale

♦  In-house R&D department for system optimization

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