The Forge Nano Helios line is designed to produce high quality, pinhole-free layers on large area parts and substrates. The patented Synchronous Modulation of Flow and Draw (SMFD-ALD) process provides the Helios system its breakthrough capabilities including its high throughput ALD at low temperature deposition and fast, high quality and low-stress thick films deposition up to 12 microns.
Key Features and Benefits
♦ Large deposition chamber (1m x 1m)
♦ High throughput growth (60-150 Å/min)
♦ 100% conformal films over any substrate topology
Applications
♦ Display and solar technology
♦ Optical coatings and OLED displays
♦ Electronic and medical devices and sensors
About Forge Nano
Global leaders in surface engineering and precision nano-coating technology, using Atomic Layer Deposition. Forge Nano’s proprietary technology and manufacturing processes make angstrom-thick coatings fast, affordable and commercially viable for a wide range of materials, applications and industries.
Why Forge Nano?
♦ Tools purpose built for performance, efficiency and throughput
♦ From lab scale to commercial scale
♦ In-house R&D department for system optimization
Related products
Superior coating performance and flexible configurations
Dedicated soft-etching instrument