Unlike traditional FTIR methods that often require contact with an ATR crystal or impose constraints on sample geometry, O-PTIR is a non-contact, reflection-mode technique that enables high-resolution IR chemical analysis directly from the sample surface. With sub-micron spatial resolution and multimodal capabilities, O-PTIR can provide complementary chemical, optical, and Raman information from the same region of interest, helping analysts better understand complex failure mechanisms.

In this webinar, you’ll learn how O-PTIR can help with:

• Non-contact chemical analysis without the need for ATR contact with FTIR trans/ATR like spectra
• Reflection-mode analysis of semiconductor samples and microelectronic devices
• Sub-micron identification of particles, residues, films, and localized defects
• Multimodal characterization combining IR, Fluorescence imaging, optical imaging, and Raman capabilities
• Improved root-cause analysis of contamination and defect-related failures

Who should attend:

• Semiconductor failure analysis engineers
• Process engineers
• Materials characterization scientists
• Analytical lab teams
• Quality and reliability engineers
• and anyone working on contamination control, yield improvement, or root-cause analysis in microelectronics.